气垫导轨在刚体转动惯量测定实验中的应用

本文介绍了一种测量刚体转动惯量的新方法。即把气垫导轨和刚体转动仪结合起来来测量刚体的转动惯量,使传统的气垫导轨实验和刚体转动惯量测定实验得以更新,提高了实验测量的精度,拓展了实验内容。     

Imprint lithography of pyramidal photonic pillars using hydrazine etching

An inexpensive method to produce a pyramidal-type 2D photonic structures in the silicon substrate was proposed. The method is based on the combination of imprint lithography and wet Si1 0 0 etching in water solution of hydrazine, which etches 1 1 1 faces much more slowly than others. Thermally grown SiO₂ mask for the hydrazine etching was used, because single Al mask cannot be well bonded to the substrate and tends to peel during the etching. It was revealed that transmittance in the infrared spectrum region of the patterned silicon decreases by about five times compared with that of flat silicon substrate and this decrease is almost independent of the angle of the incident beam. In the infrared region, decrease of transmittance of the patterned samples is directly proportional to the wave number. The shape of formed pyramids has strong influence on the transmittance. Decrease of the transmittance is much more rapid and larger in the case of sharpless pillars.     

电致发光色纯性增强的硅基有机微腔

报道了硅基有机微腔的电致发光（EL）.该微腔由上半透明金属膜、中心有源多层膜和多孔硅分布Bragg反射镜（PS DBR）组成.半透明金属膜由Ag（２０nm）构成，充当发光器件的负电极和微腔的上反射镜.有源多层膜由Al (1 nm) / LiF(05 nm) /Alq3/Alq3:DCJTB/NPB/CuPc/ITO/SiO2组成，其中的Al/LiF为电子注入层，ITO为正电极，SiO2为使正、负电极电隔离的介质层.该PS DBR是采用设备简单、成本低廉且非常省时的电化学腐蚀法用单晶Si来制备的；该PS 关键词： 电化学腐蚀 电致发光 窄峰发射 硅基有机微腔     

一种简易云雾室的制作

本文利用自制云雾室把微观粒子的运动转化为宏观现象，从而供实验观察和研究。     

High-density plasma etching of indium-zinc oxide films in Ar/Cl2 and Ar/CH4/H2 chemistries

The dry etching characteristics of transparent and conductive indium-zinc oxide (IZO) films have been investigated using an inductively coupled high-density plasma. While the Cl₂-based plasma mixture showed little enhancement over physical sputtering in a pure argon atmosphere, the CH₄/H₂/Ar chemistry produced an increase of the IZO etch rate. On the other hand, the surface morphology of IZO films after etching in Ar and Ar/Cl₂ discharges is smooth, whereas that after etching in CH₄/H₂/Ar presents particle-like features resulting from the preferential desorption of In- and O-containing products. Etching in CH₄/H₂/Ar also produces formation of a Zn-rich surface layer, whose thickness (∼40 nm) is well-above the expected range of incident ions in the material (∼1 nm). Such alteration of the IZO layer after etching in CH₄/H₂/Ar plasmas is expected to have a significant impact on the transparent electrode properties in optoelectronic device fabrication.     

Microstructure effect on microtopography of chemically etched α + β Ti alloys

Microstructure effect on chemical etching behavior of the annealed Ti-6Al-4V and Ti-3Al-2.5V titanium (Ti) alloys was compared with that of unalloyed commercially pure titanium. The microstructural evolution of structure phases after annealing the titanium and its alloys at temperature near and above β transus and followed by furnace cooling to room temperature was studied using optical microscope, scanning electron microscope and X-ray diffraction techniques. The microstructure study illustrates that the heat treatment enhanced partitioning effect allows extensive formation of hemispherical and near spherical pits roughened surface to be readily acquired by chemically etching the annealed α + β titanium alloys. The kinetics of the chemical etching reaction process show a linear dependence on time. The annealed α + β titanium alloys that exhibit relatively lower weight loss and thickness reduction rate illustrate less chemical activity than the annealed unalloyed titanium.     

Indoor radon measurements in dwellings of four Saudi Arabian cities

An indoor radon survey of a total of 269 dwellings, with one dosimeter per house, distributed in four Saudi Arabian cities was carried out. The objective of this survey was to carry out indoor radon measurements of two cities in the Eastern Province, Khafji and Hafr Al-Batin and to compare this with two cities in the Western Province, Al-Madina and Taif. The survey provides additional information about indoor radon concentrations in Saudi Arabia. The results of the survey in these cities showed that the overall minimum, maximum and average radon concentration were 7,137 and 30 Bqm⁻³, respectively. The lowest average radon concentration (20 Bqm⁻³) was found in Hafr Al-Batin, while the highest average concentration was found in Khafji (40 Bqm⁻³).     

Uniformity in radon exhalation from construction materials using can technique

The uniformity in radon exhalation rates for 46 tiles of granite, marble and ceramic used as construction materials were determined using “Can Technique” employing CR-39 nuclear track detectors (NTDs). On each tile, two sealed cans, each enclosing one NTD fixed at the center of the tile surface area covered by the can, were mounted at two different locations of each individual tiles. The track production rates on the NTDs representing radon exhalation rates were measured. The radon exhalation rates from the surface of individual tiles showed uniform exhalations within the calculated uncertainties of the measured values. This makes Can Technique an alternative simple method to measure radon exhalation rates. Calibration required to convert track production rates into radon exhalation rates for the used can and NTD was done using an active technique. The correlation between the measurements by the two techniques shows a good linear correlation coefficient (0.83).     

Microstructure array on Si and SiOx generated by micro-contact printing, wet chemical etching and reactive ion etching

A method, combining micro-contact printing (μCP), wet chemical etching and reactive ion etching (RIE), is reported to fabricate microstructures on Si and SiOx. Positive and negative structures were generated based on different stamps used for μCP. The reproducibility of the obtained microstructures shows the methodology reported herein could be useful in Micro-Electro-Mechanical Systems (MEMS), optical and biological sensing applications.     

线性规划的符号跟踪算法

分析了只含一个约束条件的线性规划最优基变量的特征，将其运用到搜寻含m个约束条件的线性规划的最优基变量，从而提出了线性规划的符号跟踪算法，为线性规划求解提供了新途径。